平台宗旨
The Materials Characterization and Preparation Facility (GZ) (MCPF (GZ)) of the Hong Kong University of Science and Technology (Guangzhou) (HKUST(GZ)) is a central research facility for the synthesis and characterization of advanced materials. It occupies about 2500 square meters of purpose-built laboratories and houses a wide range of sophisticated equipment...
双束聚焦离子束系统
Main specifications 1. Bi ion source for analysis, ion beam current: >40 nA, maximum repetition rate: 50 kHz (for all modes of operation). Pulsed ion beam current: ≥ 40 pA, minimum pulsed beam diameter: ≤ 50 nm (for high-resolution imaging modes). Fast imaging mode available, minimum beam spot diameter: ≤...
电子束蒸发金属镀膜仪I
Main specifications 1. 配备两级真空泵，极限真空度优于8x10-8 Torr 2. 配备直流，射频和磁性增强共4个3英寸圆形共焦溅射靶枪 3. 直流输出功率1200瓦，射频600瓦 4. 配备直径8英寸射频偏压工件台，可兼容4/6英寸样品 5. 薄膜沉积均匀性片内优于±5%，片间优于±3% （6 英寸基片范围） Main functions 1. 采用向下溅射方式 2. 配备Load-lock （预真空室）送样方式 3. 采用Windows计算机全自动操作系统，图形化显示及记录所有系统运行数据 Notes 设备仅接受送样，仅限于电子束蒸发金属镀膜，送样请注明镀膜金属材料名称及镀膜厚度。
电子束蒸发金属镀膜仪II
Main specifications 1. 配备两级真空泵，极限真空度优于8x10-8 Torr 2. 配备直流，射频和磁性增强共4个3英寸圆形共焦溅射靶枪 3. 直流输出功率1200瓦，射频600瓦 4. 配备直径8英寸射频偏压工件台，可兼容4/6英寸样品 5. 薄膜沉积均匀性片内优于±5%，片间优于±3% （6 英寸基片范围） Main functions 1. 采用向下溅射方式 2. 配备Load-lock （预真空室）送样方式 3. 采用Windows计算机全自动操作系统，图形化显示及记录所有系统运行数据 Notes 设备仅接受送样，仅限于电子束蒸发金属镀膜，送样请注明镀膜金属材料名称及镀膜厚度。
磁控溅射镀膜仪
Main specifications 1. 配备两级真空泵，极限真空度优于8x10-8 Torr 2. 配置一个6 x 15cc电子束源，功率8干瓦，最大高压10干伏 3. 可固定8英寸圆片及兼容4/6英寸样品 4. 膜厚控制仪速率分辨率＜±0.035A，蒸镀率显示0.1 A/S，膜厚分辨率＜1A 5. 薄膜沉积均匀性片内优于±3%，片间优于±3% (8英寸基片范围) Main functions 1. 配备X/Y扫描控制器，手动或自动选择电子束扫描模式 2. 采用Windows计算机全自动操作系统，图形化显示及记录所有系统运行数据 Notes 设备仅接受送样，仅限于磁控溅射金属镀膜，送样请注明镀膜金属材料名称及镀膜厚度。
精密离子减薄仪
Main specifications 1. Ion guns: Two penning ion guns; 2. Milling angle: +10° to -10°; 3. Rotation: 1–6 rpm; 4. X, Y translation: +/-0.5mm; 5. Ion beam energy: 0.1–8.0 kV; 6. Ion current density peak: 10 mA/cm^2; 7. Specimen exchange time: <60s Main functions Precision ion polishing system is used...
高真空溅射镀膜仪
Main specifications 1. 真空度可达5x10-5mbar； Main functions 1. 设备采用触摸屏控制，过程全自动操作
显微共焦激光拉曼光谱仪
Main specifications 1. spectral resolution:0.95 cm-1; 2. Spectral sensitivity: signal to noise ratio of Silicon third-order peak(1440 cm-1): ≥35:1; 3. laser: 325 nm excitation, 532 nm excitation, 633 nm excitation, 785 nm excitation, 1064 nm excitation; 4. Microscopic imaging spatial resolution: the lateral resolution is 0.4 um, and the longitudinal...