Surface Analysis

Main specifications

1. Bi ion source for analysis, ion beam current: >40 nA, maximum repetition rate: 50 kHz (for all modes of operation).

2. Pulsed ion beam current: ≥ 40 pA, minimum pulsed beam diameter: ≤ 50 nm (for high-resolution imaging modes). Fast imaging mode available, minimum beam spot diameter: ≤ 90 nm @ 350 pA DC2.G-SIMS analysis is supported in hardware and software, and G-SIMS analysis can be performed on organic macromolecules, and the G parameter can be changed in real time to change the molecular ion peak and fragment peak ratio, which helps to determine organic macromolecules.

3. Analytical sensitivity > 8.0×108 Al+/nC @ 7000 (FWHM). Mass resolution when analyzing insulators (on PET: 104amu): ≥ 18000 (half-peak width; 100% transmission rate)

4. High-performance Orbitrap mass spectrometer with mass accuracy: < 1 ppm (RMS), enabling Ar ion cluster ion sources with minimum ion beam spot < 3um.

5. EDR Analyzer: maximum count rate > 1×e7 counts/sec in linear response range

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Main functions

1.The new Nanoprobe has a high lateral resolution of < 50 nm.

2. Mass resolution > 30,000, 3 times more sensitive

3. Unique delayed extraction mode to obtain better than 50 nm lateral resolution at 10,000+ mass resolution

4. High precision diaphragm switching system combined with fully automatic ion beam alignment function. Can choose from 9 diaphragms and align with nanometer precision in <2s

5. Dual-beam ion source for depth profiling of all inorganic materials.

6. Multivariate statistical analysis (MVSA) software package with integrated mass spectrometry, imaging, depth profiling and 3D analysis

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Precautions for sample testing

Sample Requirements:

The sample should be a thin slice with dimensions between 1–1.5 cm in length and width, and a thickness less than 0.5 cm. The sample must be suitable for vacuum environments and should be in solid or powder form. It should not contain any toxic, harmful, corrosive, or radioactive substances. If the sample is magnetic, please notify us in advance.

Main Accessories:

1. Liquid Metal Ion Gun (LMIG) - Bismuth Manganese (BiMn) Cluster Ion Gun Nanoprobe 50;

2. Electron Beam Bombardment Gas Ion Source (O Source);

3. Thermal Ionization Cs Ion Source;

4. Argon Cluster Ion Source (GCIB);

5. Focused Ion Beam (FIB): Gallium (Ga) ion FIB etching ion source, capable of providing complete FIB milling and FIB tomography functions.

6. Variable Temperature Stage: Full temperature-controlled resistive heating and liquid nitrogen (LN2) cooling system, allowing for sample heating and cooling within chamber. Temperature control range: -150°C to 600°C.